Plasma chemistry gas phase auxiliary deposition equipment
Aegis is a unique new plasma enlargement mode chemistry gas phase deposition system, the design uses by silicon-based on the thin film deposition (SiO2, SiNx, SiOxNy, a-SixHy). This system has provided the plasma chemistry gas phase auxiliary deposition system standard function in the very compact space. The computer touchscreen provided a friendly operation contact surface to use by the connection parameter control and the system regulation memory. This system is the superelevation brightness LED chip large scale production ideal choice.application: (1) deposits the silica (SiO2) (2) to deposit the silicon nitride (SiNx)
