Nasca the plus series induction coupling plasma sculpture system used the high density plasma sculpture speed to be quick fully, aeolotropic sculpture uniformity good characteristic. Can provide the more system regulation method and the stable high density plasma production, supports the diameter from 2 inches to 8 inch chip sculptures. Increased the end point detector, strengthened to the etching process control. application: the
(1) sculpture ultra uses silicon thin film
(2) sculpture metallic film massively
(3) sculpture GaAs, GaN, InP and in other compound semiconductor thin film
(4) MEMS silicon deep sculpture
(5) wave guide component's production |
