1, exposing lamp source

 high pressure mercury lamp power 350W;

to make public photo source size: 10cmX10cm;

 photo source wave length: NUV (including 365nm,400nm,435nm);

 uniformity: + in -5%;

 power source supply: 350W,has the power regulation hypothesis function;

 the photo source position fixed does not move;

2, phantom system

two 7 time of invariable percentage lens, enlargement time of 50X-350X

 double CCD phantom system, two 9 " black and white screen;

 has the coaxial photo source; to time spacing 3.5cm-15cm;

about the lens position may right do on time, around adjusts up and down, about the base actuates by the air cylinder, to do moves;

3, to make public alignment

tool the light covers the vacuum cup: 5 " c up-draft;

wafer vacuum cup: 4 ", may operate 4 ", 3 " the wafer and the broken piece, have the place to time;

has moves the light cover, the wafer horizontal adjustment function adjustable lays the grain the cover, vacuum of adsorptive attraction size the wafer;

the to make public pattern has the vacuum contact type and recently received -like;

the X, Y axis adjusts 12mm. The Z axis adjusts 5mm, adjusting characterist 2um;

 the alignment tool actuates by the air cylinder, to proceed to make the alignment movement, will make to make public movement in the future;

4, operating system

manual operation kneading board;

has the light to cover the vacuum, the wafer vacuum, dial gage of timer time setting the adsorption vacuum: 0.1-999 second;

foolproof function;

5, seat-s on a plane

installs has the quakeproof air cushion, has shocks proof the function good;

installs has the adjustment foot place and the wheel, facilitates the localization;

6, performance

picks the vacuum contact to make public graph analysis to be possible to reach in 1 um;

picks recently received -like to make public approximately in 5-10um;